Selective reactive ion etching of phosphorus-doped oxide over undoped SiO2

• 1 March 1993
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 11  (2) , 279-285
• https://doi.org/10.1116/1.578726

Abstract

Keywords

• REACTIVE ION ETCHING
• PHOSPHORUS