4. Vertical electrode configuration to avoid contaminating particles in sputtered ZnO thin films
- 1 December 1978
- Vol. 28 (12) , 529-532
- https://doi.org/10.1016/0042-207x(78)90005-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Josephson Tunneling Barriers by rf Sputter Etching in an Oxygen PlasmaJournal of Applied Physics, 1971
- The Formation of Metal Oxide Films Using Gaseous and Solid ElectrolytesJournal of the Electrochemical Society, 1963