Magnetic properties of CoZr amorphous films prepared by low energy ion beam sputtering
- 1 September 1986
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 22 (5) , 1110-1112
- https://doi.org/10.1109/tmag.1986.1064569
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Magnetic properties of ion beam sputtered Co-Zr and Co-Zr-Re amorphous filmsIEEE Transactions on Magnetics, 1985
- Deposition of amorphous Co-Ta and Co-Zr thin films by means of double ion beam sputteringIEEE Transactions on Magnetics, 1984
- A thin film head for high density magnetic recording using CoZr amorphous filmsJournal of Applied Physics, 1984
- Magnetic properties of zero magnetostriction Co-Ta-Zr amorphous alloy films deposited by RF sputteringIEEE Transactions on Magnetics, 1983
- Technology and applications of broad-beam ion sources used in sputtering. Part I. Ion source technologyJournal of Vacuum Science and Technology, 1982