Investigations of microstructure of thin TbFeCo films by high-resolution electron microscopy (abstract)
- 1 May 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 67 (9) , 5954
- https://doi.org/10.1063/1.346025
Abstract
High-resolution electron microscopy has been applied to the study of the microstructure of TbFeCo alloys. Recently, we reported on the presence of microcrystals (2.5–7.5 nm) in sputter-deposited TbFeCo alloys,1 but their possible role in influencing the magnetic properties of these alloys is not yet clear. We have conducted further studies on structures consisting of SiN(8.0 nm)/TbFeCo(20 nm)/SiN(12.5 nm)/Si. Observations were made both in top view and cross section using standard techniques such as bright- and dark-field diffraction contrast imaging, as well as high resolution. We have confirmed the presence of nanocrystals in our plan-view observations. In addition, we conducted annealing experiments (ex situ) and recorded changes in magnetic properties such as coercivity. We find after about 36 h annealing time at 200 °C that the crystals grow from ∼3 nm to about 20 nm. The Hc change was measured to be −35%, but it is noted that most of the change occurred within the first 100 s (−25%). We will conduct further measurements to investigate whether the nanocrystallites are related in any way to the magnetic anisotropy of these alloys.This publication has 0 references indexed in Scilit: