Growth of Selective Tungsten on Self‐Aligned Ti and PtNi Silicides by Low Pressure Chemical Vapor Deposition
- 1 August 1986
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 133 (8) , 1715-1721
- https://doi.org/10.1149/1.2109001