The effect of background plasma in the undulator on free electron lasers
- 1 September 1988
- journal article
- research article
- Published by Taylor & Francis in International Journal of Electronics
- Vol. 65 (3) , 551-564
- https://doi.org/10.1080/00207218808945252
Abstract
A new unconventional FEL scheme (named PFEL), which has injected rarefied ionized background plasma in the undulator, is studied theoretically. It is shown that there exists a critical density np; for the background plasma. When the background plasma density np is higher than np c, the FEL can no longer be excited. When np ≲ np c, the laser gain for Raman FEL may be increased noticeably.Keywords
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