Spatial And Size Distributions Of Submicron Particles In rf Plasmas
- 30 January 1990
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 1185, 164-171
- https://doi.org/10.1117/12.978057
Abstract
Submicron diameter particles were grown and observed in an rf plasma while etching silicon. The plasma, created by an rf discharge in argon-CF2Cl2 mixtures in a parallel plate geometry, was probed by light from a pulsed dye laser. The scattered laser light provided a measure of the size and space distribution of the particles. The particles were observed to be spatially distributed, reaching a peak density just outside the plasma-sheath boundary. Particle size distributions, determined from the pulse-height spectrum of the scattered light intensity, were estimated to peak at radii of less than one micron.Keywords
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