Photochemical delineation of waveguides in polymeric thin films

Abstract
Polymeric materials that exhibit a controlled change in refractive index upon irradiation with UV light are promising candidates for the development of polymeric optical interconnects. We have demonstrated that polymers containing nitrone functional groups can be spatially patterned for single-mode waveguide devices using both laser direct writing and traditional photolithographic techniques.

This publication has 0 references indexed in Scilit: