Electron Cyclotron Resonance Plasma Etching of AlGaN in Cl2/Ar and BCl3/Ar Plasmas
- 1 June 1997
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 144 (6) , 2146-2149
- https://doi.org/10.1149/1.1837754
Abstract
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