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Resolution limits for electron-beam lithography
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Resolution limits for electron-beam lithography
Resolution limits for electron-beam lithography
AB
A. N. Broers
A. N. Broers
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1 July 1988
journal article
Published by
IBM
in
IBM Journal of Research and Development
Vol. 32
(4)
,
502-513
https://doi.org/10.1147/rd.324.0502
Abstract
No abstract available
Cited
Cited by 111 articles
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