Microstructure of Implanted and Rapid Thermal Annealed Semi‐Insulating Polycrystalline Oxygen‐Doped Silicon

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1 April 1987

journal article
Published by The Electrochemical Society in Journal of the Electrochemical Society

Vol. 134 (4) , 998-1003
https://doi.org/10.1149/1.2100612

Abstract

No abstract available

Keywords

MICROSTRUCTURES

Cited by 3 articles