A theoretical and experimental analysis of the buried-source VMOS dynamic RAM cell

1 October 1978

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices

Vol. 25 (10) , 1204-1213
https://doi.org/10.1109/t-ed.1978.19253

Abstract

The buried-source dynamic RAM cell combines a VMOS transistor (VMOST) and a buried junction capacitor to make a one-transistor cell (1TC) providing large storage capacitance, long charge retention, and high density. The threshold voltage, breakdown voltage, and weak inversion current for the forward and reverse modes of operation of the VMOST and the junction capacitance are experimentally related to the nonuniform doping profile of the channel. Equations are developed for the VMOST short-channel threshold voltage and storage capacity of the cell. The charge capacity (per unit of cell area) of the buried-source cell is calculated to be 2.5 times that of the conventional 1TC cell. The cell charge retention time was measured at more than 1 s at 100°C, proving operation of the device as a dynamic memory element. The technology is capable of producing an 80-µm²cell using 4-µm minimum features, no cell contacts, and a single level of interconnect.

Keywords

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