Thin films prepared from tetramethyltin
- 1 December 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 155 (1) , 65-74
- https://doi.org/10.1016/0040-6090(87)90453-6
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
- Thickness Dependence of Transport Properties of Doped Polycrystalline Tin Oxide FilmsJournal of the Electrochemical Society, 1985
- The study of electrical properties of polycrystalline tin filmsPhysica Status Solidi (a), 1984
- Thin film studies of oxides by the organometallic-CVD techniqueProgress in Crystal Growth and Characterization, 1983
- Stability of SnO2 thin films used for photovoltaic devicesSolar Energy, 1983
- Preparation and properties of Si/SnO2 heterojunctionsSolar Energy Materials, 1983
- Chemical vapour deposition of tin oxide films and their electrical propertiesJournal of Physics D: Applied Physics, 1981
- Some optical properties of polymer films prepared by glow discharge polymerization from methane, tetramethylsilane, and tetramethytinJournal of Polymer Science Part C: Polymer Letters, 1980
- Organotin polymers formed by glow-discharge polymerizationThe Journal of Physical Chemistry, 1980
- The composition of organo-tin polymer films on metallic substrate materialsThin Solid Films, 1979
- Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External SurfacesPhysical Review B, 1970