Temporary carbon barriers in the preparation of H2-permselective silica membranes
- 22 December 1999
- journal article
- Published by Elsevier
- Vol. 103 (3) , 211-218
- https://doi.org/10.1016/0376-7388(95)00004-v
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Preparation of H2 Permselective Silica Membranes by Alternating Reactant Vapor DepositionIndustrial & Engineering Chemistry Research, 1995
- Structure and aging characteristics of H2-permselective SiO2-Vycor membranesJournal of Membrane Science, 1994
- Direct formation of polyimide thin films by vapor deposition polymerizationThin Solid Films, 1993
- A kinetic model of membrane formation by CVD of SiO2 and Al2O3AIChE Journal, 1992
- Synthesis of hydrogen-permselective membranes by modified chemical vapor deposition. Microstructure and permselectivity of silica/carbon/Vycor membranesIndustrial & Engineering Chemistry Research, 1992
- Synthesis of hydrogen permselective silicon dioxide, titanium dioxide, aluminum oxide, and boron oxide membranes from the chloride precursorsIndustrial & Engineering Chemistry Research, 1991
- Highly oriented polyamide thin films prepared by vapor deposition polymerizationThin Solid Films, 1991
- Interfacial Synthesis in the Preparation of Reverse Osmosis MembranesJournal of Macromolecular Science: Part A - Chemistry, 1981
- The formation of glasslike carbon by pyrolysis of polyfurfuryl alcohol and phenolic resinCarbon, 1969
- Differential thermal analysis of furfuryl alcohol resin bindersCarbon, 1969