Characteristics of CA Resist in EUV Lithography.

• 1 January 2002
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 15  (3) , 361-366
• https://doi.org/10.2494/photopolymer.15.361

Abstract

Keywords

• EUV LITHOGRAPHY
• CHARACTERISTICS OF CA
• CA RESIST IN EUV