Thin Film Manufacturing by Computer Control

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Abstract
In the thin film semiconductor manufacturing field there is an ever increasing effort toward product quality and uniformity. This paper describes the computerized evaporation process for the manufacturing of interconnecting aluminum metallurgy on silicon substrates. An IBM 1800 data acquisition and control system has been programmed to interface with several modified Veeco manufacturing evaporation systems. The function of the 1800 was to completely control the evaporation cycle, record discreet and continuous process data, perform data retrieval, and provide failure recovery mechanisms. The computer-controlled runs are compared statistically to manually controlled runs in this paper for three major process parameters: film thickness, rate of deposition, and alloy concentration (copper percent concentration in the aluminum films).

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