Impact of Lithographic Grid Irregularity Assessed on Photonic Crystal Device Selectivity
- 1 March 2007
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Technology Letters
- Vol. 19 (5) , 282-284
- https://doi.org/10.1109/lpt.2007.891238
Abstract
The gridding irregularities of electron beam lithography may deterministically disorder photonic crystals (PhC). Their practical impact is addressed on a PhC wavelength selective device using a large grid size of 8 nm. The device operation, based on confined resonances and propagation mini-stopbands in a multimode waveguide, is deterministically blurred. Scattering length scales are correspondingly discussed. Strategies for higher throughput lithography are proposed accordinglyKeywords
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