Epitaxial growth of ultrathin Al2O3 films on Ta(110)
- 10 June 1994
- journal article
- Published by Elsevier in Surface Science
- Vol. 312 (3) , L767-L773
- https://doi.org/10.1016/0039-6028(94)90719-6
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- Preparation of a well ordered aluminum oxide layer on NiAl(001)Journal of Electron Spectroscopy and Related Phenomena, 1993
- The structure of monolayer films of FeO on Pt(111)Surface Science, 1993
- Adsorption and reaction of molecules on surfaces of metal—metal oxide systemsJournal of Molecular Catalysis, 1993
- Initial stages of oxidation of the Ni3Al alloy: structure and composition of the aluminum oxide overlayer studied by XPS, LEIS and LEEDSurface Science, 1992
- Formation of a well-ordered aluminium oxide overlayer by oxidation of NiAl(110)Surface Science, 1991
- Synthesis and characterization of ultra-thin MgO films on Mo(100)Chemical Physics Letters, 1991
- Thermal behavior of a rhodium/alumina model catalyst: disappearance of surface rhodium upon heatingThe Journal of Physical Chemistry, 1990
- High resolution EELS measurements of CO adsorption on Pt/Al2O3 model catalysts via impact scatteringSurface Science, 1988
- Preparation of alumina coatings by chemical vapour depositionThin Solid Films, 1986
- The application of high resolution electron energy loss spectroscopy to the study of model supported metal catalystsApplications of Surface Science, 1980