The deposition of thin films of materials with high melting points on substrates at room temperature using the pulse plasma method
- 19 June 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 80 (1-3) , 249-254
- https://doi.org/10.1016/0040-6090(81)90230-3
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Preparation of hard coatings by ion beam methodsThin Solid Films, 1979
- Reactive pulse plasma crystallization of diamond and diamond-like carbonJournal of Crystal Growth, 1979
- Mechanical properties of hard carbon filmsThin Solid Films, 1979
- Structure and properties of transparent and hard carbon filmsSurface Science, 1979
- The growth of carbon films with random atomic structure from ion impact damage in a hydrocarbon plasmaThin Solid Films, 1979
- Deposition of wurtzite type boron nitride layers by reactive pulse plasma crystallizationJournal of Crystal Growth, 1979
- Crystallization from a reactive pulse plasmaJournal of Crystal Growth, 1977