Pressure dependency of the NF3-H2transverse-discharge pulse-initiated HF chemical laser
- 1 July 1973
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 9 (7) , 723-730
- https://doi.org/10.1109/jqe.1973.1077725
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- The characteristics of an electron-beam-initiated pulsed chemical laserChemical Physics Letters, 1971
- Chemical hydrogen fluoride lasers from flash photolysis of various N2F4+RH systemsThe Journal of Physical Chemistry, 1971
- Electron beam and flashlamp initiation of a pulsed hydrogen fluoride chemical laserChemical Physics Letters, 1971
- Pulsed discharge initiated chemical lasers - Part II: HF laser emission from NF3and N2F4systemsIEEE Journal of Quantum Electronics, 1971
- Transversely pulse-initiated chemical lasers: Preliminary performance of the HF systemChemical Physics Letters, 1971
- Thermally initiated HF chemical laserChemical Physics Letters, 1971
- Chemical hydrogen fluoride lasers from nitrogen fluoride-molecular hydrogen and nitrogen fluoride-ethane systemsThe Journal of Physical Chemistry, 1971
- “Complete” and “Partial” Vibrational Inversion in Chemically Pumped Molecular LasersThe Journal of Chemical Physics, 1970
- CHEMICAL LASERSSoviet Physics Uspekhi, 1970
- CHEMICAL LASERSUspekhi Fizicheskih Nauk, 1970