Linewidth metrology for x-ray masks with subhalfmicron feature size
- 1 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 653-659
- https://doi.org/10.1016/0167-9317(87)90101-8
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Analysis Of Linewidth Measurement Techniques Using The Low Voltage SEMPublished by SPIE-Intl Soc Optical Eng ,1987