In situ grown YBa2Cu3O7−δ thin films by sequential ion beam sputtering
- 31 May 1990
- journal article
- Published by Elsevier in Materials Letters
- Vol. 9 (9) , 336-338
- https://doi.org/10.1016/0167-577x(90)90174-k
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Y-Ba-Cu-O/Dy-Ba-Cu-O superlattices: A first step towards the artificial construction of high-superconductorsPhysical Review Letters, 1989
- Epitaxial film growths of artificial (Bi-O)/(Sr-Ca-Cu-O) layered structuresApplied Physics Letters, 1989
- Role of atomic oxygen in the low-temperature growth of YBa2Cu3O7−δ thin films by laser ablation depositionApplied Physics Letters, 1989
- I n s i t u epitaxial growth of Y1Ba2Cu3O7−x films by molecular beam epitaxy with an activated oxygen sourceApplied Physics Letters, 1988
- Smooth high T c Y1Ba2Cu3Ox films by laser deposition at 650 °CApplied Physics Letters, 1988
- Preferentially oriented epitaxial Y-Ba-Cu-O films prepared by the ion beam sputtering methodJournal of Applied Physics, 1988
- Deposition of superconducting Y-Ba-Cu-O films at 400 °C without post-annealingApplied Physics Letters, 1988
- I n s i t u preparation of Y-Ba-Cu-O superconducting thin films by magnetron sputteringApplied Physics Letters, 1988
- Single-Crystal YBa2Cu3O7-x Thin Films by Activated Reactive EvaporationJapanese Journal of Applied Physics, 1988
- Low-temperature process for the preparation of high T c superconducting thin filmsApplied Physics Letters, 1987