Electron backstream to the source plasma region in an ion source
- 1 July 1980
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 51 (7) , 3614-3621
- https://doi.org/10.1063/1.328141
Abstract
The flux of backstream electrons to the source plasma region increases significantly with the acceleration voltage of an ion beam, so that the back plate in the arc chamber should be broken for quasi‐dc operation. The flux of backstream electrons is estimated at the acceleration voltage of 50–100 kV for a proton beam with the aid of ion beam simulation code. The power flux of backstream electrons is up to about 7% of the total beam output at the acceleration voltage of 75 kV. It is pointed out that the conventional ion sources such as the duoPIGatron or the bucket source which use a magnetic field for source plasma production are not suitable for quasi‐dc and high‐energy ion sources, because the surface heat flux of the back plate is increased by the focusing of backstream electrons and the removal of it is quite difficult. A new ion sourc which has an electron beam dump in the arc chamber is proposed.This publication has 3 references indexed in Scilit:
- Cooling of extraction electrode of an ion source in long-pulse operationReview of Scientific Instruments, 1979
- Numerical simulation for design of a two-stage acceleration system in a megawatt power ion sourceJournal of Applied Physics, 1978
- Plasma confinement by localized cuspsPhysics of Fluids, 1976