An ion-implanted subsurface monolithic Zener diode

Abstract
A new ion-implanted subsurface Zener diode structure compatible with bipolar monolithic technology is described. A well-controlled p-implant level determines the breakdown voltage of 6.17 V with a typical measured standard deviation less than 20 mV. The measured long-term stability of the resulting diode was better than 1 mV after continuous operation at 125/spl deg/C for 100h. Temperature compensation of the diode yielded a 6.70 V reference with a temperature coefficient less than 9 ppm//spl deg/C.

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