The formation of amorphous Ni–B by solid state and ion-beam reaction
- 1 December 1989
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 4 (6) , 1303-1306
- https://doi.org/10.1557/jmr.1989.1303
Abstract
An amorphous Ni–B alloy was formed at the interfaces between layers of polycrystalline nickel and amorphous boron during electron-beam deposition of Ni/B/Ni trilayer structures. Formation of the amorphous alloy appears to be thermally-assisted and, in addition, the amorphous alloy regions can be extended by post-deposition ion-beam mixing. The existence of an upper limit to the thickness of the amorphous Ni–B alloy layer which forms (40 nm) indicates that the amorphous layer serves as a reaction or diffusion barrier. It has been shown for the first time that an amorphous metal-boron alloy is produced by thermal solid state amorphization reaction (SSAR).Keywords
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