A study of the undercutting characteristics in the TMAH-IPA system
- 1 September 1992
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 2 (3) , 181-183
- https://doi.org/10.1088/0960-1317/2/3/014
Abstract
A new etching system of tetramethyl ammonium hydroxide-2-propanol (TMAH-IPA) is suggested. The undercutting ratio for TMAH at 80 degrees C is about 7, much higher than for KOH etchants. The addition of IPA in the TMAH system maintains the main features of TMAH and reduces the undercutting ratio by a factor of 2-3.Keywords
This publication has 1 reference indexed in Scilit:
- Fabrication of Non‐Underetched Convex Corners in Anisotropic Etching of (100)‐Silicon in Aqueous KOH with Respect to Novel Micromechanic ElementsJournal of the Electrochemical Society, 1990