Preparation of Si3N4 by Chemical Vapor Deposition (Effects of Raw Gas Flow Rate)
Open Access
- 1 January 1977
- journal article
- Published by Japan Institute of Metals in Journal of the Japan Institute of Metals and Materials
- Vol. 41 (4) , 358-367
- https://doi.org/10.2320/jinstmet1952.41.4_358
Abstract
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