Physical and technological limits in optical and x-ray lithography
- 31 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 53-60
- https://doi.org/10.1016/0167-9317(87)90016-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Submicron Optical Lithography Using A KrF Excimer Laser Projection Exposure SystemPublished by SPIE-Intl Soc Optical Eng ,1987
- Defects in x-ray masks: Detection and printabilityJournal of Vacuum Science & Technology B, 1987
- Influence of absorber stress on the precision of x-ray masksJournal of Vacuum Science & Technology B, 1986
- Contrast studies in high-performance projection opticsIEEE Transactions on Electron Devices, 1983