Characteristics of Penning ionization gauge type compact microwave metal ion source

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Abstract
A sputteringion source utilizing both microwave and Penning ionization gauge (PIG) ionizations for the primary ion beam deposition is described. The size of the source is 60 mm in diameter and 80 mm long. The continuous ion beams of refractory metals (Ta, W, Mo) with the ion currents of 100 to 150 μA are obtained for gas pressure on the order of 10−3 Torr in the plasma production chamber, microwave power under 40 W, and PIG discharge power under 80 W. This source has been operated with two different discharge modes, either glow discharge or arc discharge. Operation of both modes becomes quite stable by introducing microwave power. Metal ion production by glow discharge is more efficient in power consumption than that by arc discharge.

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