Atomic-scale mechanisms of the halogenation of Cu(100)
Open Access
- 1 April 1998
- journal article
- Published by Elsevier in Surface Science
- Vol. 401 (2) , 173-184
- https://doi.org/10.1016/s0039-6028(97)01034-0
Abstract
No abstract availableKeywords
This publication has 29 references indexed in Scilit:
- Effect of Adsorbed Iodine on the Dissolution and Deposition Reactions of Ag(100): Studies by In Situ STMThe Journal of Physical Chemistry B, 1997
- Layer-by-layer anodic dissolution of sulfur-modified ni(100) electrodes: in situ scanning tunneling microscopyJournal of Electroanalytical Chemistry, 1996
- Scanning Tunneling Microscopic Study with Atomic Resolution of the Dissolution of Cu(100) Electrodes in Aqueous Chloride MediaThe Journal of Physical Chemistry, 1995
- Step Faceting: Origin of the Temperature Dependent Induction Period in Ni(100) OxidationPhysical Review Letters, 1995
- Scanning Tunneling Microscopic Study with Atomic Resolution of the Dissolution of Cu(111) in Aqueous Chloride SolutionsJournal of the American Chemical Society, 1994
- Interactional effects in corrosive chemisorption of chlorine and oxygen on iron(110)Langmuir, 1992
- Interaction of chlorine with iron(110) in the temperature range 90-1050 KJournal of the American Chemical Society, 1992
- Structural steps to oxidation of Ni(100)The Journal of Chemical Physics, 1990
- The etching of Cu(100) with Cl2Journal of Vacuum Science & Technology A, 1985
- Geometry and Electronic Structure of Cl on the Cu {001} SurfacePhysical Review Letters, 1982