Ce-doped TiO 2 Insulators in Thin Film Electroluminescent Devices

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Abstract
Cerium-doped TiO2 thin films have been prepared by reactive RF sputtering. At low Ce concentration, X-ray diffraction indicates that the films have the anatase structure. Ce concentrations higher than 1.2 at.% result in an amorphization of the film which remains stable up to 873 K. The TiO2 electrical properties have been stabilized and improved by cerium doping, resulting in a lower conductivity (10-9 Ω-1m-1), a higher electrical breakdown strength (2 ×107 V/m), and a high value of the permittivity (45±5). The implementation of amorphous TiO2:Ce thin films as insulator layers in ZnS:Mn alternating current thin film electroluminescent devices (ACTFELD) results in a significant drop in the threshold operating voltage and a notable increase in the device brightness compared with ACTFELD containing Y2O3 or BaTa2O6 insulator layers. Rapid thermal annealing further improves the performance of the electroluminescent device.