Evaluation of a positive tone chemically amplified deep UV resist for E-beam applications
- 31 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4) , 299-302
- https://doi.org/10.1016/0167-9317(94)90160-0
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Process latitude for the chemical amplification resists AZ PF514 and AZ PN114Published by SPIE-Intl Soc Optical Eng ,1991