Effects of a SiO₂Capping Layer on the Electrical Properties and Morphology of Nickel Silicides

• 15 April 2002
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 41  (Part 1, No) , 1969-1973
• https://doi.org/10.1143/jjap.41.1969

Abstract

Keywords

• LEAKAGE CURRENT
• SHEET RESISTANCE
• NICKEL
• TRANSMISSION ELECTRON MICROSCOPY
• SCANNING ELECTRON MICROSCOPY
• THERMAL STABILITY
• X RAY DIFFRACTION