Formation and Properties of Thin Tunnelable SiO2 Films Using a Vaporized O 2 Source at Liquid N 2 Temperature
- 1 May 1978
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 125 (5) , 766-771
- https://doi.org/10.1149/1.2131545
Abstract
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