CHEMICAL VAPOR DEPOSITION OF TITANIUM CARBIDE ON AISI M2 TOOL STEELS AND Si3N4-TiC CERAMIC COMPOSITE
- 1 January 1990
- journal article
- research article
- Published by Taylor & Francis in Materials and Manufacturing Processes
- Vol. 5 (1) , 63-78
- https://doi.org/10.1080/10426919008953229
Abstract
TiC deposition experiments were performed on high speed steel and on Si3N4-TiC composite ceramic cutting tools through chemical vapor deposition (CVD) using gaseous mixture of TiCl4, CH4, and H2. The effects of the deposition temperature and the composition of reactant gases on deposition rate, structure and microhardness of the TiC film were investigated. Experimental apparatus and deposition procedures are also presented. Deposition at 1323K with (CH4/TiCl4) ratio of 1.2 gives the optimum mechanical properties of the film for AISI M2 steel substrate while Si3 N4-TiC composite shows its maximum strength at 1373K and 1.3(CH4/TiCl4).Keywords
This publication has 11 references indexed in Scilit:
- Effect of chromium in substrate steel on the chemical vapour deposition of TiCJournal of Materials Science, 1987
- The effect of substrate steel on the chemical vapour deposition of TiC onto tool steelsThin Solid Films, 1987
- Interfacial chemistry effects on the adhesion of sputter-deposited TiC films to steel substratesThin Solid Films, 1982
- Tribological and protective coatings by chemical vapour depositionThin Solid Films, 1981
- The nature of the transition region formed between dc-bases rf sputtered TiC films and steel substratesSurface Science, 1978
- Structure and Strength Effects in CVD Titanium Carbide and Titanium Nitride CoatingsJournal of the Electrochemical Society, 1976
- Preparation and properties of hard-material layers for metal machining and jewelryJournal of Vacuum Science and Technology, 1975
- Some properties of TiC-coated cemented tungsten carbidesMetals Technology, 1974
- The Effect of Substrate Temperature on the Structure of Titanium Carbide Deposited by Activated Reactive EvaporationJournal of Vacuum Science and Technology, 1972
- The Chemical Vapor Deposition of Titanium Carbide Coatings on IronJournal of the Electrochemical Society, 1967