Dynamic implant profiling by low-energy nuclear reaction spectroscopy
- 15 September 1977
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 145 (3) , 507-516
- https://doi.org/10.1016/0029-554x(77)90580-8
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Recoil contribution to ion-implantation energy-deposition distributionsJournal of Applied Physics, 1975
- Depth distribution profiling of deuterium and 3HeJournal of Nuclear Materials, 1974
- Use of the D-D reaction to locate deuterium implanted in metalsNuclear Instruments and Methods, 1974
- Depth distribution of implanted helium and other low-z elements in metal films using proton backscatteringApplied Physics Letters, 1973
- Use of the nuclear reaction 16O(d,α)14N in the microanalysis of oxide surface layersNuclear Instruments and Methods, 1973
- Spatial distribution of ions incident on solid target as a function of instantaneous energyRadiation Effects, 1971
- A study of deuterium implantation in a copper drive-in targetNuclear Instruments and Methods, 1971
- Microanalysis by the direct observation of nuclear reactions using a 2 MeV Van de GraaffNuclear Instruments and Methods, 1971
- Use of the Nuclear Reaction O16(d, p)O17 to Study Oxygen Diffusion in Solids and its Application to ZirconiumJournal of Applied Physics, 1968
- Monoergic Neutrons from Charged Particle ReactionsReviews of Modern Physics, 1949