Generation and Recombination of Defects in Vitreous Silica Induced by Irradiation with a Near-Infrared Femtosecond Laser
- 23 March 2000
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry B
- Vol. 104 (15) , 3450-3455
- https://doi.org/10.1021/jp992828h
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- Microfabrication and Characteristics of Two-Dimensional Photonic Crystal Structures in Vitreous SilicaOptical Review, 1999
- Three-Dimensional Optical Data Storage in Vitreous SilicaJapanese Journal of Applied Physics, 1998
- Surface Chemistry Induced by High Energy Radiation in Silica of Small Particle StructuresThe Journal of Physical Chemistry B, 1997
- Correlation of preexisting diamagnetic defect centers with induced paramagnetic defect centers by ultraviolet or vacuum-ultraviolet photons in high-purity silica glassesPhysical Review B, 1993
- 248 nm induced vacuum UV spectral changes in optical fibre preform cores: support for a colour centre model of photosensitivityElectronics Letters, 1993
- Paramagnetic Point Defects in Amorphous Silicon Dioxide and Amorphous Silicon Nitride Thin Films: I .Journal of the Electrochemical Society, 1992
- Experimental evidence for excitonic mechanism of defect generation in high-purity silicaPhysical Review Letters, 1991
- Optical Properties and Structure of Defects in Silica GlassJournal of the Ceramic Society of Japan, 1991
- Correlated defect creation and dose-dependent radiation sensitivity in amorphousPhysical Review B, 1989
- Oxygen-diffusion kinetics in densified, amorphousPhysical Review B, 1987