Efficient LaF_3:Nd^3+-based vacuum-ultraviolet laser at 172 nm
- 1 June 1992
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America B
- Vol. 9 (7) , 1148-1150
- https://doi.org/10.1364/josab.9.001148
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 13 references indexed in Scilit:
- Solid state LaF3: Nd3+ vuv laser pumped by a pulsed discharge F2-molecular laser at 157 nmOptics Communications, 1992
- Gain and saturation measurements in a discharge excited F2 laser using an oscillator amplifier configurationApplied Physics B Laser and Optics, 1990
- Spectral-kinetic and Lasing Characteristics of New Nd3+-activated Laser Hosts of the KF-YF3SystemJournal of Modern Optics, 1990
- Amplification Characteristics of a Discharge Excited F2LaserJournal of Modern Optics, 1990
- Efficient population inversion in excimer states by supersonic expansion of discharge plasmasOptics Letters, 1989
- Vacuum ultraviolet laser emission from Nd+3:LaF3Applied Physics Letters, 1985
- Generation of continuously tunable coherent vacuum-ultraviolet radiation (140 to 106 nm) in zinc vaporOptics Letters, 1982
- Vacuum ultraviolet spectroscopy of molecules using third-harmonic generation in rare gasesThe Journal of Chemical Physics, 1982
- Vacuum-ultraviolet luminescence of LaF3 single crystalsUspekhi Fizicheskih Nauk, 1978
- VUV fluorescence of Nd3+-, Er3+, and Tm3+-doped trifluorides and tunable coherent sources from 1650 to 2600 ÅApplied Physics Letters, 1976