Electron Beam Fabrication Of Computer-Generated Holograms
- 1 August 1985
- journal article
- Published by SPIE-Intl Soc Optical Eng in Optical Engineering
- Vol. 24 (5) , 245803-245803-
- https://doi.org/10.1117/12.7973578
Abstract
We report here the development of an integrated capability for writing computer-generated holograms (CGHs) using either of two commercially available electron-beam lithography systems. These binary, chrome-on-glass holograms have been used extensively for aspheric optical testing and also have applications to the interferometric recording of holograms. Algorithms are described for encoding CGHs for drawing by e-beam systems. Limitations of e-beam CGH fabrication are discussed. A self-contact lithography and ion milling process is described for con-verting chrome-on-glass holograms into 40% efficient, environmentally durable all-glass holograms.Keywords
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