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High Rate Photoresist Stripping in an Oxygen Afterglow
Home
Publications
High Rate Photoresist Stripping in an Oxygen Afterglow
High Rate Photoresist Stripping in an Oxygen Afterglow
JS
John E. Spencer
John E. Spencer
RB
Richard A. Borel
Richard A. Borel
AH
Andrew Hoff
Andrew Hoff
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1 September 1986
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 133
(9)
,
1922-1925
https://doi.org/10.1149/1.2109050
Abstract
No abstract available
Cited
Cited by 35 articles
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