Electrochemical deposition of metals onto silicon
- 21 August 1998
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 31 (16) , 1927-1949
- https://doi.org/10.1088/0022-3727/31/16/001
Abstract
No abstract availableThis publication has 85 references indexed in Scilit:
- Direct and surface state mediated electron transfer at semiconductor/electrolyte junctions—II. A comparison of the interfacial admittanceElectrochimica Acta, 1997
- Mechanism of Metallic Particle Growth and Metal‐Induced Pitting on Si Wafer Surface in Wet Chemical ProcessingJournal of the Electrochemical Society, 1994
- Etching of Silicon in NaOH Solutions: I . In Situ Scanning Tunneling Microscopic Investigation of n‐Si(111)Journal of the Electrochemical Society, 1993
- The impact of semiconductors on the concepts of electrochemistryElectrochimica Acta, 1990
- Semiconductor electrode modifications: influence on the state distribution at the interfaceElectrochimica Acta, 1989
- Investigation of Electroreduction Kinetics on Modified p ‐ InP in Alkaline ElectrolyteJournal of the Electrochemical Society, 1985
- Calculation of overlap for nucleation and three-dimensional growth of centresElectrochimica Acta, 1982
- Study of Stabilization and Surface Recombination on n ‐ GaP Photoelectrodes: Mechanisms and InterrelationJournal of the Electrochemical Society, 1982
- Surface modification in semiconductor liquid-junction cellsFaraday Discussions of the Chemical Society, 1980
- Electrolytic Deposition of Thin Metal Films on Semiconductor SubstratesJournal of the Electrochemical Society, 1977