Application of the physics of plasma sheaths to the modeling of rf plasma reactors
- 1 November 1986
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 60 (9) , 3081-3087
- https://doi.org/10.1063/1.337764
Abstract
An equivalent circuit model is presented for a planar rf plasma reactor. The physical properties of the plasma sheath adjacent to the electrodes are incorporated in the model. The sheath capacitances and the conduction currents through the sheaths are time varying and have a highly nonlinear dependence on the potentials across the plasma sheaths. The model shows that the waveforms of the voltage differences across the sheaths are highly nonsinusoidal and agree with reported measurements.This publication has 11 references indexed in Scilit:
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