Effect of grain size on the oxidation kinetics of sputtered titanium nitride films

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Abstract
The oxidation kinetics of sputtered titanium nitride films has been studied as a function of as-deposited grain size. Films of varying grain size have been heated in air at 200 and 300 °C for 24-h time periods. Resulting oxide layers have been measured by Auger depth profiling, and the rate of oxidation related to average grain diameter. Single-crystal films grown on MgO have also been oxidized to provide a comparative end point. Grain diameters have been determined from measurement of the breadth of observed x-ray diffraction peaks, with calculated diameters ranging from 133 to 545 Å. A strong dependence of oxidation rate on as-deposited grain size is observed.

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