A Study of Photoacid Structure Dependence on Lithographic Performance in Chemically Amplified Resists.
- 1 January 1996
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 9 (4) , 591-600
- https://doi.org/10.2494/photopolymer.9.591
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