Porous silicon pn junction light emitting diodes
- 1 November 1999
- journal article
- Published by IOP Publishing in Semiconductor Science and Technology
- Vol. 14 (11) , 988-993
- https://doi.org/10.1088/0268-1242/14/11/308
Abstract
This paper presents the results of a systematic study of porous silicon light emitting diodes (LEDs). Porous silicon pn junction LEDs, both patterned and unpatterned, were fabricated using the standard anodization method as well as a novel technique developed for the anodization of heavily doped pn junction structures. The current-voltage, photoluminescence and electroluminescence properties of the various porous silicon pn junction LEDs were investigated. The devices fabricated by the standard method show electroluminescence only under reverse bias conditions. The pn junctions fabricated by the novel anodization technique show electroluminescence under forward bias conditions. The light emission mechanism in these devices is believed to be due to electron-hole injection in the silicon nanostructures forming the porous silicon material.Keywords
This publication has 19 references indexed in Scilit:
- 200 MHz optical signal modulation from a porous silicon light emitting deviceApplied Physics Letters, 1998
- Porous Silicon Based Light Emitting Diodes: A Progress ReportPhysica Status Solidi (a), 1998
- Integrated Optoelectronic Unit Based on Porous SiliconPhysica Status Solidi (a), 1998
- Porous Silicon: From Luminescence to LEDsPhysics Today, 1997
- Progress towards silicon optoelectronics using porous silicon technologyApplied Surface Science, 1996
- Visible light emission from heavily doped porous silicon homojunction pn diodesApplied Physics Letters, 1993
- Visible electroluminescence from porous silicon np heterojunction diodesApplied Physics Letters, 1992
- Visible electroluminescence from porous siliconApplied Physics Letters, 1992
- Current-induced light emission from a porous silicon deviceIEEE Electron Device Letters, 1991
- Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafersApplied Physics Letters, 1990