Artifact-free near-field optical imaging by apertureless microscopy
- 31 July 2000
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 77 (5) , 621-623
- https://doi.org/10.1063/1.127064
Abstract
A method for optical near field discrimination, leading to drastic artifact reduction in superresolved imaging by scanning interference apertureless microscopy is presented. The method relies on second harmonic detection of the modulated optical signal scattered by a vibrating silicon tip. An edge resolution of 15 nm, or 7 nm Rayleigh-type resolution, with optical contrast as high as 50%, has been obtained on aluminum projection pattern samples in the constant gap width mode. Our method has been determined not to be affected by topographical artifacts by constant height mode scans.Keywords
This publication has 14 references indexed in Scilit:
- Influence of detection conditions on near-field optical imagingJournal of Applied Physics, 1998
- Enhanced sensitivity near-field scanning optical microscopy at high spatial resolutionApplied Physics Letters, 1998
- A reflection-mode apertureless scanning near-field optical microscope developed from a commercial scanning probe microscopeReview of Scientific Instruments, 1998
- Apertureless near-field optical microscopy with differential and close-proximity detectionApplied Physics Letters, 1997
- Optical data storage read out at 256 Gbits/in.2Applied Physics Letters, 1997
- Theory for the apertureless near-field optical microscope: Image resolutionApplied Physics Letters, 1995
- Apertureless near-field optical microscopeApplied Physics Letters, 1994
- Near field optical microscopy by local perturbation of a diffraction spotMicroscopy Microanalysis Microstructures, 1994
- Optical stethoscopy: Image recording with resolution λ/20Applied Physics Letters, 1984
- Development of a 500 Å spatial resolution light microscopeUltramicroscopy, 1984