Quantitative infrared characterization of plasma enhanced CVD silicon oxynitride films
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 1051-1054
- https://doi.org/10.1016/0022-3093(87)90252-3
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Plasma-enhanced growth and composition of silicon oxynitride filmsJournal of Applied Physics, 1986
- Time-of-flight system for profiling recoiled light elementsNuclear Instruments and Methods in Physics Research, 1983