Preparation and Properties of ZrF4-Based Fluoride Glass Films by Plasma-Enhanced Chemical Vapor Deposition
- 1 August 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (8B) , L1498
- https://doi.org/10.1143/jjap.30.l1498
Abstract
ZrF4-based binary glass films are for the first time synthesized by plasma-enhanced chemical vapor deposition (PCVD) and their optical transmission spectrum is measured from the UV to near IR region. The films are pore-free and transparent. No absorption band caused by OH or other impurities can be observed in the near IR region. Weak absorption bands attributed to defect centers, which are induced by plasma bombardment, are observed in the UV to visible region.Keywords
This publication has 8 references indexed in Scilit:
- Low loss fluoride fibre by reduced pressure castingElectronics Letters, 1990
- Organometallic Chemical Vapor Deposition of ZrF4-Based Fluoride GlassesJapanese Journal of Applied Physics, 1989
- Scattering characteristics of fluoride optical fibersApplied Optics, 1987
- Radiation effects in ZrF4 based glassesJournal of Non-Crystalline Solids, 1985
- Radiation effects in ZrF4 based glassesJournal of Non-Crystalline Solids, 1985
- Fabrication of Low OH and Low Loss Fluoride Optical FiberJapanese Journal of Applied Physics, 1984
- Prediction of loss minima in infra-red optical fibresElectronics Letters, 1981
- Thermochemical properties of inorganic substancesPublished by Springer Nature ,1977