Polymeric Self-Assembled Monolayers. 3. Pattern Transfer by Use of Photolithography, Electrochemical Methods, and an Ultrathin, Self-Assembled Diacetylenic Resist
- 1 May 1995
- journal article
- Published by American Chemical Society (ACS) in Journal of the American Chemical Society
- Vol. 117 (21) , 5875-5876
- https://doi.org/10.1021/ja00126a037
Abstract
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