Novel isolation process using selective polysilicon filled trench technology for high speed bipolar circuits

Publisher Website

4 December 2002

conference paper
Published by Institute of Electrical and Electronics Engineers (IEEE)

https://doi.org/10.1109/bipol.1990.171118

Abstract

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Keywords

This publication has 1 reference indexed in Scilit:

Scaling limitations of submicron local oxidation technology
Published by Institute of Electrical and Electronics Engineers (IEEE) ,1985